Oxford Instruments FlexAL

Models in this family

1. 

   FlexAL

   Oxford Instruments FlexAL is an atomic layer deposition system compatible with TiN, TaN, TiO, TaO, and SiN.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   System 100 PECVD / FlexAL ALD (thermal/plasma) cluster system	—	—	Cluster configuration with FlexAL ALD and PlasmaLab 100 PECVD sharing a common loadlock	uwaterloo.ca[1]

Sources