Waferpedia

Tool family

Raith EBPG5000

RaithLithography1 entry

The Raith EBPG5000 is an electron-beam lithography system used for write lithography and related nanolithography work, with sub-10 nm feature capability stated in one source.

LinkedIn X Email

Models in this family

  1. EBPG5000

    Cited variants

    DesignationGenerationVintageChangesSource
    EBPG5000ES——The EBPG5000ES is a version of the EBPG5000 equipped with a 100 keV thermal field emission gun, Gaussian beam, and 50 MHz pattern generator.epfl.ch[1]
    EBPG5200 (also known as EBPG5000 Plus)——The EBPG5200 is the latest model in the EBPG series, featuring 155 mm writing capability, support for wafers and masks up to 6″, minimum feature size below 8 nm, 20–100 kV operating voltage, and 50/100 MHz pattern generator.pnf.uchicago.edu[2]
    EBPG5200 (EBPG5000 Plus)——Configuration used at UChicago Pritzker Nanofab; 155 mm writing capability, wafers/masks up to 6 in, 20/50/100 kV thermal field emission gun, 50/100 MHz pattern generator, variable field size to 1 mm.pnf.uchicago.edu[2]

Sources

Sources (2)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.ch
  2. [2]pnf.uchicago.edupnf.uchicago.edu