AJA
300
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The AJA 300 is a 300 amp water cooled thermal evaporation source used in AJA thermal evaporation systems.[1][2][3]
What it is
General reference — not yet source-verifiedThe AJA 300 is a physical vapor deposition (PVD) system that uses magnetron sputtering to deposit thin films of metals, dielectrics, and other materials onto substrates. Machines of this class are typically configured as load-locked or batch systems, offering precise control over film thickness and uniformity in a vacuum environment.
How it works
General reference — not yet source-verifiedIn magnetron sputtering systems like the AJA 300, a target material is bombarded by energetic ions from a plasma, causing atoms to be ejected and deposited onto a substrate. A magnetic field confines the plasma near the target, increasing sputter rate and reducing substrate heating. The process occurs in a vacuum chamber with controlled gas flow (usually argon) and often multiple target sources for co-deposition or multilayer films.
Applications
General reference — not yet source-verifiedCommon applications include depositing conductive layers (such as electrodes or interconnects), magnetic films, optical coatings, and protective layers in microelectronics, photovoltaics, and sensors.
- Thermal evaporation
What do the numbers mean?
Power & electrical2
Dimensions & facilities1
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What types of materials can be deposited with a magnetron sputtering system?General reference — not yet source-verified
Such systems can deposit a wide range of materials, including metals, alloys, oxides, nitrides, and other compounds, depending on the target material and process gases used.
What is the typical substrate size for a research-grade sputter tool?General reference — not yet source-verified
Machines in this class generally accommodate substrates ranging from small pieces to wafers several inches in diameter, often with manual or automated handling.
How is film thickness controlled in a sputtering system?General reference — not yet source-verified
Thickness is controlled by deposition rate and time, monitored via quartz crystal microbalances or optical sensors, and calibrated for specific target-substrate distances.
Can the system deposit multilayer films without breaking vacuum?General reference — not yet source-verified
Yes, many such tools are equipped with multiple target sources and shutters, allowing sequential or co-deposition of different materials in a single pumpdown.
Not publicly documented
The following facts about the 300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 300 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 300 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 300 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 300 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 300 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]web.archive.org — web.archive.orgweb.archive.org
- [3]Thin Film Deposition Sputtering Manufacturer — web.archive.orgweb.archive.org
Last updated Oct 4, 2026.
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