Applied Materials

The Applied Materials Centura is a semiconductor deposition system used for chemical vapor deposition.
A chemical vapor deposition system introduces process gases into a controlled chamber and forms a thin film on the wafer surface by reaction or decomposition at the substrate.
A deposition platform of this class is built to control gas delivery, chamber conditions, and wafer exposure so that films can be applied repeatably across the wafer.
The Centura sits in the film-deposition portion of semiconductor manufacturing, after earlier wafer preparation steps and before later patterning or etch steps that use the deposited film.
A deposition tool of this class is used when a process needs a new material layer on the wafer rather than material removal.
A CVD deposition system is generally used to form insulating, conductive, or barrier films in integrated-circuit fabrication.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Ultima+ HDP | — | 2002 | — | Equipment inventory listing[6] |
| 3 C/H, DxZ | — | 2000 | — | Equipment inventory listing[7] |
| SIGEN 4CH | — | — | — | Equipment inventory listing[9] |
| Centura CVD (Chemical Vapor Deposition) | — | 2000 | Listed with product details including 8" Ultima+ HDP, 8" 3 C/H DxZ, and 12" SIGEN 4CH. | Equipment inventory listing[6] |
| Centura Etcher | — | 2003 | Listed as an etcher variant with 12" wafer size and EMAX CT Plus. | Equipment inventory listing[8] |
| Centura CVD Ultima+ HDP | — | 2002 | 8-inch CVD configuration; described as Ultima+ HDP with 2002 vintage. | Equipment inventory listing[6] |
| Centura CVD DxZ | — | 2000 | 8-inch CVD configuration; described as 3 C/H DxZ with 2000 vintage. | Equipment inventory listing[7] |
| Centura Etcher EMAX CT Plus | — | 2003 | 12-inch etch configuration; described as 3 C/H EMAX CT Plus with 2003 vintage. | Equipment inventory listing[8] |
| Centura CVD SIGEN 4CH | — | — | 12-inch CVD configuration; described as SIGEN 4CH. | Equipment inventory listing[9] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Tracked replaceable assemblies, spares criticality, and availability status across all major subsystems. Each entry cites its source.
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The following facts about the Centura are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Centura are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly hosted manuals, SOPs, or datasheets for the Centura are on record.
Answerable by: university cleanroom staff or an OEM application specialist
No research found yet — worked with this tool? Share what you know.
Last updated Oct 8, 2026.
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