Applied Materials
Centura Ultima+ HDP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Power
Ch A – Ultima+ (ENI AM200 RF Generator)[1]
Vacuum
Stepper Turbo Throttle Valve with 3 veins[2]
Gas delivery
Ceramic gas nozzles[2]
What it is
The Centura Ultima+ HDP is a high-density plasma chemical vapor deposition (CVD) system manufactured by Applied Materials. The system is designed for 200 mm and 300 mm wafer processing.[1][2]
How it works
The Ultima HDP system features dual RF coils for gap-fill capability across the wafer. The system uses an electrostatic chuck for wafer clamping and temperature control. Remote plasma cleaning is employed for chamber maintenance.[2]
Where it fits in the process flow
General reference — not yet source-verifiedIn the semiconductor fabrication flow, HDP CVD deposition typically follows the formation of transistor structures for STI fill, and later for dielectric layers between metal interconnects. The void-free gapfill is critical for sub-micron nodes.
Applications
The Centura Ultima+ HDP deposits undoped and doped dielectric films for a range of applications including shallow trench isolation, pre-metal dielectric, inter-level dielectric, inter-metal dielectric, and passivation.[2]
What do the numbers mean?
Power & electrical3
- Ch A – Ultima+ (ENI AM200 RF Generator)[1]
Vacuum & pumping5
Wafer handling4
Gas & chemistry3
Configuration & options7
- Ch E – Multi-slot cooldown[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationCh A – Ultima+ (ENI AM200 RF Generator)[1]
- RF Generator (Ch A)ENI AM200[1]
- Gas RingCeramic gas nozzles[2]
- Center Gas Nozzle/BafflePresent[2]
- RF GeneratorsTop, Side, and Bias[2]
- Vacuum System - Throttle ValveStepper Turbo Throttle Valve with 3 veins[2]
- Vacuum System - Gate ValvePendulum Gate Valve[2]
- Vacuum System - Turbo PumpPresent[2]
- Gas Boxes15 stick AP Gas Boxes (incl. Methane line)[2]
- Endpoint DetectorForeline FTIR[2]
- ForelineHeater Jacketed[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
How does the system achieve void-free gapfill?
The system uses dual RF coils to generate a high-density plasma, along with an electrostatic chuck for precise temperature control, enabling void-free gapfill of high-aspect-ratio features.[2]
What type of cleaning method does the system use?
The system uses remote plasma cleaning.[2]
Does the system support doped films?
Yes, the system deposits both undoped and doped films.[2]
Not publicly documented
The following facts about the Centura Ultima+ HDP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura Ultima+ HDP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura Ultima+ HDP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura Ultima+ HDP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura Ultima+ HDP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura Ultima+ HDP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]media-moov-co.s3.us-west-1.amazonaws.com — media-moov-co.s3.us-west-1.amazonaws.commedia-moov-co.s3.us-west-1.amazonaws.com
Last updated Aug 14, 2026.
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