Applied Materials
Reflexion 3600
What it is
The Applied Materials Reflexion 3600 is a chemical mechanical polisher used for chemical mechanical planarization in semiconductor manufacturing.[1][5]
The Reflexion 3600 is a CMP tool from Applied Materials.[1][5]
How it works
Where it fits in the process flow
What do the numbers mean?
Power & electrical1
Wafer handling2
Gas & chemistry2
Control & software5
Configuration & options17
- SW version:[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- GigaMat 3806 L— Same function class: CMP, UnknownCompare in depthsource[2]
- Nova V 2600— Same function class: CMP, nullCompare in depthsource[3]
- SUSS MicroTec PA 300 Control— Same function class: CMP, nullCompare in depthsource[4]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Reflexion 3600 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Reflexion 3600 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Reflexion 3600 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Reflexion 3600 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Reflexion 3600 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Reflexion 3600 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Equipment inventory listing
- [3]waferpedia.comwaferpedia.com
- [4]waferpedia.comwaferpedia.com
- [5]Reflexion 3600 — Applied Materials | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 3, 2026.
Compare with similar tools
View all →The GigaMat 3806 L is a polisher with a water jet and 480 VAC, 60 Hz power specification.
The SUSS MicroTec PA 300 Control is a CMP tool with a 500 VA, 115V, 60Hz power spec and a 12-inch nickel plated aluminum chuck.
The Nova V 2600 is a CMP (Chemical Mechanical Polisher) for 12-inch wafers.
The Logitech 1 DP 41 is a polisher with 3-phase, 50/60 Hz, 480 V, 12 amp electrical requirements.
