Applied Materials
VIISta HCP+
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Applied Materials / Varian VIISta HCP+ is a high current ion implanter. Applied Materials / Varian VIISta HCP+ is configured for 12-inch wafer processing. Applied Materials / Varian VIISta HCP+ is configured for 300 mm wafer processing.[1][2][3]
What it is
How it works
General reference — not yet source-verifiedAn ion implanter introduces dopant atoms into a semiconductor wafer by forming an ion beam and directing that beam onto selected regions of the substrate.
A high current ion implanter is used for implant steps that require substantial dopant dose delivery.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a front-end semiconductor process used after pattern definition to modify the electrical properties of exposed regions of the wafer.
Ion implantation is followed by annealing to activate dopants and repair lattice damage caused by the implant.
Applications
What do the numbers mean?
Wafer handling2
Configuration & options4
- High Current[3]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Varian Viision 200— Same function class: Ion Implantation, nullCompare in depthsource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the VIISta HCP+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISta HCP+ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISta HCP+ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISta HCP+ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISta HCP+ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISta HCP+ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]inventory listing
- [4]Applied Materials Varian VIISta HCP+ High Current Implanter for sale — fabsurplus.comfabsurplus.com
Last updated Oct 5, 2026.
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The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
