Axcelis
GSD 100 High Current
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Axcelis GSD 100 High Current is a high current ion implanter. The Axcelis GSD 100 High Current processes 6-inch wafers.[1]
What it is
The Axcelis GSD 100 High Current is a high-current ion implanter used for doping semiconductor wafers. The system handles wafers of 6 inches (150 mm) in diameter.[1]
Where it fits in the process flow
General reference — not yet source-verifiedThe GSD 100 High Current is used in the doping step of semiconductor fabrication. The process typically follows photolithographic patterning and precedes thermal annealing. The implant step introduces dopant atoms into exposed regions of the wafer, and subsequent annealing activates the dopants and repairs crystal damage. In the fab flow, ion implantation is a critical step for defining transistor junctions and other doped areas.
What do the numbers mean?
Wafer handling1
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the Axcelis GSD 100 High Current support?
The GSD 100 High Current supports 6-inch wafers.[1]
Not publicly documented
The following facts about the GSD 100 High Current are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the GSD 100 High Current are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the GSD 100 High Current are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the GSD 100 High Current are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the GSD 100 High Current are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the GSD 100 High Current are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Sep 23, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
