Waferpedia

CEE

Spin

CEE Spin family
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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The CEE Spin is a photoresist spinner. The CEE Spin applies coatings to substrates up to 200mm round or 7 in. square. The CEE Spin spins at speeds up to 6000 rpm.[1]

Spin — Inventory photo
Fig. 01SpinInventory photo[2]

Performance

programmable Precision Hot Plate Bake[1]

Gas delivery

photoresist spinner[1]

What it is

The CEE Spin Coater supports coating substrates up to 200 mm round or 7 in. square.[1]

How it works

The CEE Spin Coater applies coatings by hand dispensing with pipettes.[1]

The CEE Spin Coater can spin at speeds up to 6000 rpm.[1]

Applications

The CEE Spin Coater is used for photoresist coating.[1]

The CEE Spin Coater is used for substrate coating in semiconductor device processing.[1]

What do the numbers mean?

Wafer handling1

Substrate size
up to 200mm round or 7 in. square[1]
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Gas & chemistry2

Equipment type
photoresist spinner[1]
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Function
photoresist spinners[1]
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Performance2

Base system
Brewer Science CEE 200CBX precision coat-bake system[1]
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Spin Coater #1 feature
programmable Precision Hot Plate Bake[1]
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Configuration & options6

Equipment type
Spin coater[2]
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Asset number
142901[2]
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Make
CEE[2]
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Maximum spin speed
6000 rpm[1]
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Spin speed
up to 6000 rpm[1]
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Spin Coater #2 type
stand-alone spinner[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Equipment typephotoresist spinner[1]
  • Functionphotoresist spinners[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the maximum substrate size for a CEE spin coater?

CEE spin coaters can apply coatings to substrates up to 200 mm round or 7 in. square.[1]

What spin speeds can a CEE spin coater achieve?

CEE spin coaters can spin at speeds up to 6000 rpm.[1]

How many dispense nozzles can be mounted in a CEE spin coater lid?

All CEE spin coaters utilize a standard multi-nozzle dispense center hub that allows up to five dispense nozzles to be mounted simultaneously.[3]

Not publicly documented

The following facts about the Spin are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Spin are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Spin are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Spin are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Spin are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Spin is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]cores.research.asu.edu — cores.research.asu.educores.research.asu.edu
  2. [2]Inventory photo
  3. [3]CEE APOGEE SPIN COATER OWNER'S MANUAL Pdf Download | ManualsLib — manualslib.commanualslib.com
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Last updated Oct 7, 2026.

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