CHA
1000
The CHA 1000 is a deposition evaporator system. The CHA 1000 is a 5-inch system. The CHA 1000 includes a 6-pocket E-gun and an SR 10 power supply.[1][2]
What it is
How it works
General reference — not yet source-verifiedAn electron beam evaporator operates by directing a high-energy electron beam at a target material contained in a crucible.
The kinetic energy of the electrons heats the target material to its vaporization point, causing it to sublimate or evaporate.
Where it fits in the process flow
General reference — not yet source-verifiedIn a typical process flow, the evaporator is placed after photolithography and before final device passivation or packaging steps.
Applications
General reference — not yet source-verifiedCommon applications include the deposition of aluminum, gold, silver, chromium, and other metals for ohmic contacts and reflective coatings.
What do the numbers mean?
Power & electrical2
- SR 10 Power Supply[2]
Vacuum & pumping6
Wafer handling3
- Tri Dome System 5" wafers (21 wafers total)[2]
Performance2
- Inficon Dep Rate Controller[2]
Control & software2
- Inficon Deposition Controller[2]
Configuration & options17
- 6 Pocket E-gun[2]
- Single Crystal Sensor (Fix Top Mounted)[2]
- Water Cooled Chamber[2]
- Standard Rebuild Includes:[2]
- Rebuilt CTI 1020R Compressor[2]
- Rebuild Valves[2]
- Rebuild High VAC[2]
- Clean Chamber[2]
- Clean Shielding[2]
- Clean Planetary's[2]
- Replace Orings[2]
- Replace Bearings[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationSR 10 Power Supply[2]
- System Base Pressure5x10^-7 Torr[2]
- ConfigurationChamber Pump Down Rate to Base Pressure in under 60 minutes[2]
- ConfigurationAutomatic Pump Down and Regen Controller[2]
- ConfigurationRebuilt CT 10 Cyro Pump[2]
- Power supplySR 10 Power Supply[1]
- Pump down rateto base pressure in under 60 minutes[2]
- Automatic controlAutomatic Pump Down and Regen Controller[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the CHA 1000 support?
The CHA 1000 is configured for five-inch wafers.[2]
How many wafers can the CHA 1000 process per batch?
The tri-dome system can hold up to twenty-one five-inch wafers.[2]
What is the base pressure of the CHA 1000?
The system base pressure is 5 × 10⁻⁷ Torr.[2]
What type of deposition controller does the CHA 1000 use?
The system uses an Inficon deposition rate controller.[2]
What is the pump-down time to base pressure?
The chamber can pump down to base pressure in under sixty minutes.[2]
Not publicly documented
The following facts about the 1000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 1000 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 1000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 1000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 1000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Inventory photo
- [3]Plasma-Therm Receives Follow-On Order in Japan for Its Heatpulse RTP System For SiC Power MOSFET Devices Used in Automot — chaindustries.com (Feb 10, 2026)web.archive.org
Last updated Oct 6, 2026.
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