Denton Vacuum
The Denton Discovery is a family of magnetron sputter deposition systems. The Discovery platform can accommodate substrates up to 300 mm. The Discovery platform supports DC, RF, and pulsed DC sputtering.[1][2][3]

Plate 01Denton Vacuum System: The Discovery Sputter Module for High-Volume III-V Semiconductor Manufacturing
Plate 02Denton Vacuum: The Accidental Ion Source: A Discovery from a Failed Experiment
Plate 03Denton Vacuum System: Changing a Cathode in a Discovery Sputtering System
The Denton Vacuum Discovery is a series of magnetron sputtering deposition systems used for physical vapor deposition (PVD) of thin films. Magnetron sputtering is a plasma-based technique that creates dense films with good adhesion, suitable for metals and insulating materials with demanding optical or electrical properties.[7][1]
The Discovery platform is highly configurable and can be tailored for different sputtering geometries, including confocal, planar (Discovery V), and inverted cylindrical (Discovery I) configurations. Variants include the Discovery 200 (for substrates up to 200 mm), Discovery 300 (for substrates up to 300 mm), Discovery V, Discovery I, and larger formats such as Discovery 635 and Discovery 785.[2][8][5]
In magnetron sputtering, a magnetically confined plasma is created near the surface of a target material. Positively charged energetic ions from the plasma collide with the negatively charged target, ejecting atoms that then deposit onto a substrate. The closed magnetic field traps electrons, increasing ionization efficiency and allowing the plasma to be sustained at lower pressures, which reduces background gas incorporation and energy losses in the sputtered atoms.[7][1]
The Discovery system can be configured with multiple cathodes in different geometries. In a confocal configuration, up to four cathodes are positioned around the substrate, enabling co-sputtering of multiple materials without breaking vacuum. The planar cathode (Discovery V) mounts directly above the substrate for high deposition rate and uniformity. The inverted cylindrical cathode (Discovery I) coats substrates on all sides, providing excellent thickness control on curved surfaces. Each cathode can be optimized for a specific deposition method, and the system supports DC, RF, and pulsed DC power supplies.[1][3][2]
The Discovery magnetron sputtering platform is used for depositing thin films in a variety of industries. Typical applications include semiconductor device manufacturing, optical coatings for filters and lenses, metal and dielectric coatings for electronics, thin-film batteries, and protective or functional coatings such as diamond-like carbon and transparent conductive oxides.[2][1]
Additional applications include high-volume production of advanced optical filters, biocompatible coatings for medical implants, thin film resistors and sensors, large area hybrid circuit fabrication, and metal contacts for compound semiconductors. The system also supports research and development activities.[3][5]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Discovery 200 | — | — | Up to 200 mm substrates; up to four 4" confocal cathodes; tri-axis adjustment; coating uniformity < +/-5% | info.dentonvacuum.com[2] |
| Discovery 300 | — | — | Up to 300 mm substrates; up to three 6" confocal cathodes; tri-axis adjustment; coating uniformity < +/-5% | info.dentonvacuum.com[2] |
| Discovery V | — | — | Planar magnetron; up to 200 mm substrates; coating uniformity < +/-2% | info.dentonvacuum.com[2] |
| Discovery I | — | — | Inverted cylindrical magnetron; up to 200 mm substrates; coating uniformity < +/-0.25% | info.dentonvacuum.com[2] |
| Discovery 635 | — | — | Maximum substrate up to 8" diameter; options include RF etch/bias, water cooled table, reactive flow control, substrate flip, in-situ ellipsometry | info.dentonvacuum.com[5] |
| Discovery 785 | — | — | Maximum substrate up to 30" diameter; options include RF etch/bias, water cooled table, reactive flow control, substrate flip, in-situ ellipsometry | info.dentonvacuum.com[5] |
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The Discovery Confocal system can accommodate up to four cathodes in a confocal arrangement, each with triaxis adjustment of offset, target-to-substrate distance, and angle.[3]
The Discovery platform supports DC, RF, and pulsed DC power supplies depending on the target material and configuration. For the inverted cylindrical cathode (Discovery I), DC and mid-frequency AC are used.[2][1]
The Discovery 200 and 300 provide coating uniformity better than ±5%. The Discovery V achieves better than ±2%, and the Discovery I achieves better than ±0.25%.[2]
The following facts about the Discovery are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Discovery are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Discovery are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Discovery are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Discovery is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Discovery are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 3, 2026.
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