Despatch
300mm-Ofen
Despatch 300mm-Ofen is a 300mm thermal process tool. Despatch 300mm-Ofen is built to process 300mm silicon wafers. Despatch 300mm-Ofen is also suitable for 200mm wafers.[1][2]
Wafer size
300mm
Performance
±1.0°C at 95°C immersion temperature.[1]
What is it?
What do the numbers mean?
Power & electrical1
- Additional features
- Meets SEMI S2/S8 and SEMATECH Appendices A, B, and C; graphical user interface; meets 300mm SEMI communication standards; FOUP ID reader; 2-level monitoring; wafer ID reader; uninterruptible power supply (UPS).[1]
Wafer handling2
- Tool capacity
- 50 wafers with standard two-chamber configuration; additional chambers can be added.[1]
Performance1
Dimensions & facilities1
Configuration & options9
- Werkzeugkapazität
- 50 Scheiben mit Standard Zwei-Kammerkonfiguration; zusätzliche Kammern können angefügt werden.[1]
- Thermische Prozesseigenschaften
- Inertatmosphäre; 175°C Maximaltemperatur; Temperaturgleichmäßigkeit ±1.0°C bei 95°C Eintaucht temperatur; aktive Kühlung für schnelles Abkühlen; HEPA-Filter.[1]
- Zusätzliche Eigenschaften
- Erfüllt SEMI S2/S8 und SEMATECH Anhänge A, B und C; grafische Benutzer-Schnittstelle (GUI); erfüllt 300mm SEMI Kommunikationsstandards; FOUP ID-Leser; 2 Ebenen Überwachung; Scheiben-ID-Leser; nicht unterbrechbare Stromversorgung (UPS).[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Additional featuresMeets SEMI S2/S8 and SEMATECH Appendices A, B, and C; graphical user interface; meets 300mm SEMI communication standards; FOUP ID reader; 2-level monitoring; wafer ID reader; uninterruptible power supply (UPS).[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 300mm-Ofen are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 300mm-Ofen are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 300mm-Ofen are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 300mm-Ofen are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 300mm-Ofen are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 300mm-Ofen is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 4, 2026.
Compare with similar tools
View all →Novellus ATHENA software is available for Novellus 300 mm tools that use the Proteus user interface.
Tokyo Electron NS300Z is a scrubber system for 300mm wafers, featuring process modules with proven reliability and stability, and offering further productivity improvements.
The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
