EV Group
The EVG 150 is a fully-automated resist processing system for spin, spray, and develop processes. The EVG 150 supports wafers up to 200 mm in diameter. The EVG 150 features a modular design with up to four wet process modules and up to twenty bake/chill units.[1]

The EVG150 processes wafers through automated resist coating and related wet processing steps. The system uses a robot for wafer handling and combines process modules for coating, developing, baking, chilling, and priming.[1]
The EVG150 can perform spin coating and spray coating, and the system can also use OmniSpray ultrasonic atomization for conformal coating of high topography. The system includes encapsulated chambers, temperature control for resist and developer lines, and process control software for recipes and data analysis.[1]
The EVG150 sits in the resist-processing segment of the lithography flow, where wafers receive coating, bake, chill, develop, and prime steps. The tool also supports edge bead removal and back-side rinse functions.[1]
The EVG150 is suited to high-throughput wafer preparation before lithographic exposure and to subsequent development and bake steps after coating. The system is intended for process lines that need automated handling of thick, thin, bowed, warped, fragile, or small-diameter wafers.[1]
The EVG150 is used for MEMS, image sensors, advanced packaging, RF, 5G, 3D sensing, photonics, automotive, and power electronics manufacturing. The system supports thick and thin positive and negative resists, dielectrics, colored resists, adhesives, and polyimides.[1]
The EVG150 includes spray and spin process options, OmniSpray conformal coating, and bake modules with temperatures up to 250 °C, with optional solvent bakes and high-temperature bakes up to 350 °C. The system also supports wide-viscosity dispense options and edge bead removal and back-side rinse processing.[1]
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| EVG150 up to 300 mm | — | — | Supports wafers up to 300 mm; up to 6 process modules; includes FOUP load ports; up to 20 bake/chill/vapor prime stacks; optional NanoSpray module for deep patterns. | evgroup.com[1] |
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The EVG150 supports double end-effector or edge handling, and it can handle bowed, warped, thin, and fragile wafers. The system also supports thick or ultrathin wafers and small-diameter wafers.[1]
The EVG150 supports thin and thick negative and positive resists, dielectrics, colored resists, adhesives, and polyimides.[1]
The following facts about the 150 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 150 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 150 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 150 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 150 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 150 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 10, 2026.
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