Waferpedia

Headway

EC-101

Photoresist spin stationHeadway EC-101 family
Research Quality: 50% complete
LinkedIn X Email

The Headway EC-101 is a photoresist spin station manufactured by Headway. The Headway EC-101 uses vacuum hold down chucks for sample holding.[1][2]

HeadwayEC-101
No photo available yet

  • Plate 01Headway Research EC-101 Spin Coater #59559

    Bid ServicellcWatch on YouTube

What it is

The Headway EC-101 is a photoresist spin station used in photolithography.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

A photoresist spin station sits early in the photolithography flow, before exposure and development.

The Headway EC-101 is used for resist coating on a prepared substrate, and the coated surface then proceeds to later lithography steps.

Applications

The Headway EC-101 is used for photoresist coating in microfabrication and cleanroom photolithography work.[1][2]

  • Photoresist coating

What do the numbers mean?

Gas & chemistry1

Equipment type
Photoresist Spin Station[1]
Accurate?

Configuration & options4

OEM
Headway[1]
Accurate?
Model
EC-101[1]
Accurate?
Materials allowed
Photoresists only[1]
Accurate?
Max simultaneous users
2 people[1]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Equipment typePhotoresist Spin Station[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What material class is permitted on the Headway EC-101?

The Headway EC-101 is for photoresists only.[1][2]

What should be used for other polymeric coatings or spin-on glasses?

Other polymeric materials and spin-on glasses should be coated on the Polymer Spin Station in the Exploratory Lab.[1][2]

What chuck practice is required during use?

The sample should use an appropriately sized vacuum hold-down chuck, and all vacuum holes must be covered by the sample.[1][2]

Not publicly documented

The following facts about the EC-101 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EC-101 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EC-101 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EC-101 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EC-101 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EC-101 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]nanocenter.umd.edu — nanocenter.umd.edunanocenter.umd.edu
  2. [2]PHOTO-09: Photoresist Spin Station- Teaching Lab- 3 | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
  3. [3]Request Equipment Training or Service | Utah Nanofab — nanofab.utah.edunanofab.utah.edu
Was this page accurate?

Last updated Oct 3, 2026.