CG 4100 CD-SEM

The Hitachi CG 4100 CD-SEM is a critical dimension scanning electron microscope used for metrology in semiconductor manufacturing. The CG 4100 CD-SEM belongs to the class of CD-SEM tools that measure sub-micron features on wafers. A CD-SEM provides high-resolution imaging and automated linewidth measurement for process control.

The Hitachi CG 4100 CD-SEM uses a focused electron beam to scan the surface of a semiconductor wafer. Secondary electrons emitted from the wafer are collected to form an image of the pattern. The tool measures critical dimensions such as linewidth and contact hole diameter by analyzing the intensity profile of the electron signal. An automated algorithm processes the signal to determine edge positions and report dimension values.

The CG 4100 CD-SEM operates in a high-vacuum environment to maintain beam stability and minimize scattering. The tool typically includes a stage for precise wafer positioning and a detector system optimized for metrology. Calibration procedures use reference standards to ensure measurement accuracy over time.

The Hitachi CG 4100 CD-SEM is used in semiconductor fabrication facilities in the metrology and inspection section. The tool is placed after lithography and etch processes to verify that critical dimensions meet design specifications. Measurement data from the CG 4100 CD-SEM feeds back to lithography and etch equipment for process tuning and defect reduction. The tool is also used for monitoring pattern integrity after development and before subsequent deposition or etch steps.

The Hitachi CG 4100 CD-SEM is applied to measure critical dimensions of etched lines, contact holes, and other features on semiconductor wafers. The tool supports process development, yield improvement, and routine production monitoring for logic, memory, and other integrated circuit technologies. CD-SEM metrology is essential for controlling linewidth variation and ensuring device performance across the wafer.