KLA
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The KLA Archer 300 is an overlay metrology system built on the Archer platform. The Archer 300 provides overlay registration and critical dimension (CD) measurements on various substrates. The system supports 300 mm (12 inch) wafer sizes.[1][2]
The Archer 300 supports overlay and CD measurements on a variety of substrate types, including silicon (Si), silicon carbide (SiC), gallium nitride (GaN), quartz, glass, and gallium arsenide (GaAs). Optional thin wafer handling down to 350 μm and thick wafer handling up to 1200 μm extend its applicability to non-standard wafer thicknesses.[2]
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Supported substrates include Si, SiC, GaN, quartz, glass, GaAs, and other transparent wafers.[2]
Optional features include ANRA, CPM, AIM targets, 5D Analyzer, and Recipe Database Manager.[2]
The following facts about the Archer 300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the Archer 300 are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Archer 300 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Archer 300 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Archer 300 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Archer 300 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Sep 28, 2026.