KLA
UV 1280 SE Thin Film Thickness Measurement
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The KLA UV 1280 SE is a thin film thickness measurement tool designed for 12-inch wafer metrology.[1][2]
What it is
How it works
General reference — not yet source-verifiedThe tool directs a beam of light onto the wafer surface and analyzes the reflected spectrum. By comparing the measured spectrum to optical models, the tool calculates the thickness and optical constants of thin films.
What do the numbers mean?
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the UV 1280 SE Thin Film Thickness Measurement are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the UV 1280 SE Thin Film Thickness Measurement are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the UV 1280 SE Thin Film Thickness Measurement are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the UV 1280 SE Thin Film Thickness Measurement are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the UV 1280 SE Thin Film Thickness Measurement are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the UV 1280 SE Thin Film Thickness Measurement is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (10)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Inventory photo
- [4]Inventory photo
- [5]Inventory photo
- [6]Inventory photo
- [7]Inventory photo
- [8]KLA P-7 vs KLA UV 1280 SE Thin Film Thickness Measurement comparison | Waferpedia — waferpedia.comwaferpedia.com
- [9]KLA PN 159336 Below Wafer Detector Assy vs KLA UV 1280 SE Thin Film Thickness Measurement comparison | Waferpedia — waferpedia.comwaferpedia.com
- [10]KLA AIT XUV Darkfield vs KLA UV 1280 SE Thin Film Thickness Measurement comparison | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
Compare with similar tools
View all →The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.
