Kurt Lesker
150LX
The Kurt Lesker 150LX is an atomic layer deposition system. The Kurt Lesker 150LX is designed for advanced research and development applications. The Kurt Lesker 150LX processes wafers up to 150 mm.[1][2][3]
What it is
How it works
The 150LX uses a plasma-assisted process that expands the deposition window by cracking precursor molecules with plasma rather than relying only on thermal energy from the heated substrate.[1]
The 150LX is a load-locked system, and the processing chamber remains isolated from the sample loading chamber to help preserve chamber cleanliness.[1]
Where it fits in the process flow
Applications
The 150LX is used for conformal thin film fabrication with atomic-scale control.[1]
The 150LX is used for materials including aluminium oxide, hafnium oxide, zirconium oxide, hafnium zirconium oxide, silicon dioxide, silicon nitride, titanium nitride, titanium oxide, aluminium nitride, platinum, and gallium oxide.[1][3][4]
The 150LX supports thermal ALD, plasma-enhanced ALD, dynamic and static exposure modes for high-aspect-ratio features, variable residence mode, and in situ ellipsometry for film-thickness monitoring.[2]
- Conformal fabrication of thin films
- Atomic-scale thin-film deposition
- Growth of Al2O3 films by thermal- or PE-ALD
- Growth of HfO2 films by thermal- or PE-ALD
- Growth of ZrO2 films by thermal- or PE-ALD
- Growth of HfZrO2 films by thermal- or PE-ALD
- Growth of TiN films by PE-ALD
- Growth of Ga2O3 films by PE-ALD
What do the numbers mean?
Power & electrical1
Wafer handling10
Gas & chemistry7
- Precursor capacity
- Up to fourteen vapor draw flow through, bubbler, ozone pulsed gas plasma process gases[2]
Optics & imaging3
Configuration & options11
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Precursor inlets to chamberFour (4), standard on chamber, independently heated[2]
- Precursor sourcesUp to twelve (12)[3]
- Precursor typesUp to fourteen (14)[2]
- Plasma source1 kW RF remote ICP[4]
- Precursor inletsFour standard on chamber, independently heated[2]
- Precursor capacityUp to fourteen vapor draw flow through, bubbler, ozone pulsed gas plasma process gases[2]
- Precursor sourcesUp to 12 precursor sources[3]
- Process gasesArgon, oxygen, nitrogen, hydrogen, ammonia, ozone[4]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What process modes are supported on the 150LX?
The 150LX supports plasma-enhanced, thermal-only, dynamic, and static exposure modes for high-aspect-ratio processing, along with variable residence mode.[2]
Not publicly documented
The following facts about the 150LX are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 150LX are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 150LX are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 150LX are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 150LX are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 150LX is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]smif.pratt.duke.edu — smif.pratt.duke.edusmif.pratt.duke.edu
- [2]lesker.com — lesker.comlesker.com
- [3]mrl.illinois.edu — mrl.illinois.edumrl.illinois.edu
- [4]confluence.nanofab.ualberta.ca — confluence.nanofab.ualberta.caconfluence.nanofab.ualberta.ca
Last updated Oct 5, 2026.
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