Lam Research

Gasonics L 3510

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The Gasonics L 3510 is a downstream plasma asher. The Gasonics L 3510 uses a microwave plasma source at 2.45 GHz. The Gasonics L 3510 supports wafer sizes up to 8 inches.^[1]^[2]^[3]^[4]

Gasonics L 3510 — Inventory photo — Fig. 01Gasonics L 3510Inventory photo^[1]

Power

0–1200 watts at 2.45 GHz^[2]

Vacuum

Abara A 70 W Dry Pump^[1]

Gas delivery

Accurate 354 C Gas Control System^[1]

What it is

The Lam Research Gasonics L 3510 is a plasma asher.^[3]^[1]^[8]

The Gasonics L 3510 is a downstream plasma ashing system for semiconductor processing.^[2]^[4]^[9]^[10]

How it works

The Gasonics L 3510 uses a microwave plasma source at 2.45 GHz.^[2]^[4]^[9]^[10]

Applications

The Gasonics L 3510 is used for photoresist stripping, bulk photoresist removal, descum, semiconductor wafer cleaning, low-damage plasma cleaning, and residue removal.^[2]^[4]^[9]^[10]

The Gasonics L 3510 is also used for compound semiconductor processing, MEMS process applications, university environments, research institutes, pilot production, and semiconductor fabrication.^[2]^[4]^[9]^[10]

What do the numbers mean?

Power & electrical1

Microwave Power: 0–1200 watts at 2.45 GHz^[2]2 sources

Vacuum & pumping3

Abara A 70 W Dry Pump^[1]
Pressure Range: 0.5 to >5.0 torr^[2]2 sources
Vacuum pump: Abara A 70 W Dry Pump^[1]

Wafer handling9

Z-Bot for 6" and 8" Wafers^[1]
Throughput: 45–60 wafers per hour^[2]2 sources
Within Wafer Uniformity: ±5% to 10% (process dependent)^[2]
Wafer-to-Wafer Uniformity: ±5% to 10% (process dependent)^[2]
Wafer Size: 75 mm to 200 mm (3 to 8 inch)^[4]
Wafer size support: 75 mm to 200 mm (3 to 8 inch); up to 8 inch capability^[4]
Wafer handling: Z-Bot for 6" and 8" wafers^[1]
Wafer transfer: Integrated solid robotic wafer transfer^[2]
Cassette station: Fixed, more stable^[2]

Gas & chemistry4

Accurate 354 C Gas Control System^[1]
Process Gases: O₂, N₂ (O₂ 5 SLM, N₂ 1 SLM typical)^[2]
Gas delivery: Accurate 354 C Gas Control System^[1]
Process gases: O2, N2^[4]

Control & software1

Controller: Allwin21 PC with touch screen monitor^[2]

Configuration & options9

With:^[1]; Ebara Merlin M 150^[1]
Platen Temperature: 100–300 °C^[2]2 sources
Ash Rate: Up to 3.5 µm/min (process dependent)^[2]
OEM: Lam Research / Gasonics^[1]
Model: L 3510^[1]
Type: Plasma asher^[1]
Process type: Downstream microwave plasma ashing^[4]
Ash rate: Up to 3.5 µm/min^[4]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

ConfigurationAbara A 70 W Dry Pump^[1]
ConfigurationAccurate 354 C Gas Control System^[1]
Microwave Power0–1200 watts at 2.45 GHz^[2]
Pressure Range0.5 to >5.0 torr^[2]
Process GasesO₂, N₂ (O₂ 5 SLM, N₂ 1 SLM typical)^[2]
Gas deliveryAccurate 354 C Gas Control System^[1]
Vacuum pumpAbara A 70 W Dry Pump^[1]
Process gasesO2, N2^[4]

Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the Gasonics L 3510 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics L 3510 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gasonics L 3510 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gasonics L 3510 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gasonics L 3510 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Gasonics L 3510 is not on record.
Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (10)Every fact above is drawn from these public sources

[1]Inventory photo
[2]allwin21.com — allwin21.comallwin21.com
[3]Gasonics L 3510 — Lam Research | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
[4]waferpedia.com — waferpedia.comwaferpedia.com
[5]Inventory photo
[6]Inventory photo
[7]Inventory photo
[8]Equipment inventory listing
[9]Gasonics L3510 plasma Asher semiconductor equipment | SemiStar — semistarcorp.comsemistarcorp.com
[10]Gasonics L 3510 Plasma Asher Single wafer ,Photoresist removal | SemiStar — semistarcorp.comsemistarcorp.com