Nikon
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The Nikon 1505 G 6 E is a g-line stepper introduced in 1988. The Nikon 1505 G 6 E uses a 5x reduction and has a resolution of 650 nm.[1][2]

Produced
1988–
Optics
5" reticle[3]
The Nikon 1505 G 6 E sits in the photolithography module after resist coating and before resist development. The tool exposes the resist through a mask so that later process steps can create the intended feature pattern in the resist film.
Introduced in 1988
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The model was introduced in 1988.[1]
The following facts about the 1505 G 6 E are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the 1505 G 6 E are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1505 G 6 E are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 1505 G 6 E are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 1505 G 6 E is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 1505 G 6 E are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 3, 2026.
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