Ontrak
The Ontrak DSS 200 Series II Post CMP Scrubber is a tool used for cleaning wafers after chemical mechanical polishing. The Ontrak DSS 200 Series II Post CMP Scrubber processes 8-inch wafers.[1][2][3][4]

Post-CMP scrubbers remove slurry residue and other contaminants from wafers after chemical mechanical polishing.
A post-CMP scrubber typically combines liquid delivery, mechanical scrubbing, rinsing, and drain handling to clean the wafer surface before the next process step.
The machine belongs in the wafer-cleaning sequence that follows planarization and prepares the wafer for downstream processing.
The Ontrak DSS 200 Series II is used in semiconductor manufacturing for post-CMP wafer cleaning.[1][5][2][3][4]
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The DSS 200 Series II is designed to process 8-inch wafers.[1][2][3][4]
The following facts about the DSS 200 Series II Post are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the DSS 200 Series II Post are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the DSS 200 Series II Post are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the DSS 200 Series II Post are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the DSS 200 Series II Post are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the DSS 200 Series II Post is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 10, 2026.
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