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Oxford Instruments

80 Plus

DepositionOxford Instruments 80 Plus family
Research Quality: 70% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

80 Plus — Inventory photo
Fig. 0180 PlusInventory photo[1]

Power

3 Phase[2]

Vacuum

200 – 2000 mTorr[3]

Gas delivery

SiH4, NH3, N2O, N2, O2, CF4[3]

What it is

The Oxford Instruments 80 Plus is a plasma-enhanced chemical vapor deposition system used for thin-film deposition.[1][3]

How it works

The Oxford Instruments 80 Plus is a PECVD tool.[1][3]

Applications

The Oxford Instruments 80 Plus is used for photonics structures, passivation layers, and hard masks.[3]

What do the numbers mean?

Power & electrical4

Phase
3 Phase[2]
Accurate?
50/60 Hz[2]
Accurate?
Voltage
415 vAC[2]
Accurate?
RF generator power
300W at 13.56 MHz[3]
Accurate?

Vacuum & pumping1

Pressure range
200 – 2000 mTorr[3]
Accurate?

Wafer handling1

Maximum wafer size
8 inches (200 mm)[3]
Accurate?

Gas & chemistry3

Process type
Plasma-enhanced chemical vapor deposition (PECVD)[3]
Accurate?
Available gases
SiH4, NH3, N2O, N2, O2, CF4[3]
Accurate?
Total gas flow range
150 – 3000 sccm[3]
Accurate?

Configuration & options1

Maximum temperature
400 °C[3]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Phase3 Phase[2]
  • Configuration50/60 Hz[2]
  • Voltage415 vAC[2]
  • Process typePlasma-enhanced chemical vapor deposition (PECVD)[3]
  • RF generator power300W at 13.56 MHz[3]
  • Available gasesSiH4, NH3, N2O, N2, O2, CF4[3]
  • Total gas flow range150 – 3000 sccm[3]
  • Pressure range200 – 2000 mTorr[3]

Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

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Not publicly documented

Field notes

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Frequently asked questions

What deposition mode does the Oxford Instruments 80 Plus use?

The Oxford Instruments 80 Plus uses plasma-enhanced chemical vapor deposition.[1][3]

Not publicly documented

The following facts about the 80 Plus are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 80 Plus are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 80 Plus are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 80 Plus are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 80 Plus are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 80 Plus is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (8)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]aggiefab.tamu.edu — aggiefab.tamu.eduaggiefab.tamu.edu
  4. [4]PlasmaLab M80 Plus – Chlorine - Core Research Facilities — cores.research.asu.educores.research.asu.edu
  5. [5]Physical Vapor Deposition — nanolab.berkeley.edunanolab.berkeley.edu
  6. [6]University-of-Utah-94-721002-System-Manual — nanofab.utah.edunanofab.utah.edu
  7. [7]Oxford Plasmalab 80 Plus | UCLA Nanolab — nanolab.ucla.edunanolab.ucla.edu
  8. [8]PECVD System Manual - Maryland University 94-219896 .pdf — nanocenter.umd.edunanocenter.umd.edu
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Last updated Oct 8, 2026.

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