Oxford Instruments

800

Deposition Oxford Instruments 800 family

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800 — Inventory photo — Fig. 01800Inventory photo^[1]

Power

13.56 MHz^[3]

Vacuum

down to -150 °C^[2]

Gas delivery

4, 8, or 12 lines^[2]

Optics

up to 20 nm/min^[3]

What is it?

The Oxford Instruments 800 is a plasma-enhanced chemical vapor deposition (PECVD) system.

What do the numbers mean?

Power & electrical3

RF frequency: 13.56 MHz^[3]
Low frequency range: 100–350 kHz^[3]
Mains power: 50/60 Hz^[3]

Vacuum & pumping1

Cryogenic temperature option: down to -150 °C^[2]

Wafer handling2

Wafer capacity (300 mm): 1^[2]
Substrate temperature range: up to 400 °C^[2]

Gas & chemistry2

Gas line options: 4, 8, or 12 lines^[2]
Process gases: SiH4, NH3, N2O, CH4, N2, Ar, He, CF4, O2^[3]

Optics & imaging2

End-point detection: Laser interferometry or optical emission spectrometry (OES)^[2]
Deposition rate (SiNx, NH3-free process): up to 20 nm/min^[3]

Control & software1

Stress control: Pulsed HF/LF power mixing^[3]

Configuration & options2

Table diameter: 380 mm or 460 mm^[2]
Process configurations: PECVD, RIE, RIE/PE dual mode, ICP^[2]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
800 Plus (Plasmalab800Plus)	—	—	Larger table (380 mm or 460 mm) and support for 300 mm wafers	nanofab.utah.edu^[2]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Cryogenic temperature optiondown to -150 °C^[2]
Gas line options4, 8, or 12 lines^[2]
RF frequency13.56 MHz^[3]
Low frequency range100–350 kHz^[3]
Process gasesSiH4, NH3, N2O, CH4, N2, Ar, He, CF4, O2^[3]
Mains power50/60 Hz^[3]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of system is the Oxford 800?

The Oxford 800 is a plasma-enhanced chemical vapor deposition (PECVD) system.^[1]

Not publicly documented

The following facts about the 800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 800 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 800 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 800 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 800 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 800 are on record.
Answerable by: an OEM parts catalog or a service engineer