Oxford Instruments
CMI 950 XRF
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
Applications
General reference — not yet source-verifiedApplications include measurement of metal and alloy coating thicknesses, analysis of multi-layer thin films, and identification of elemental contaminants.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Error 9g (shutter is not in the right position)
What do the numbers mean?
Configuration & options6
- Error 9g (shutter is not in the right position)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the typical measurement principle of an XRF tool?General reference — not yet source-verified
XRF tools measure the characteristic fluorescent X-rays emitted by a sample when it is irradiated. The energy and intensity of these X-rays identify which elements are present and in what quantity, allowing determination of film composition and thickness.
What are the typical limitations of XRF for thin-film measurement?General reference — not yet source-verified
Limitations include difficulty detecting elements lighter than sodium (unless using vacuum or helium purge), interference between overlapping spectral lines, and reduced sensitivity for very thin films (sub-nanometer) or when the substrate contributes a strong background. Matrix effects and interlayer interactions also require sophisticated modeling.
How is calibration performed for an XRF tool?General reference — not yet source-verified
Calibration is typically done using known reference standards, either certified thin-film samples or bulk materials. For thin-film applications, empirical calibration curves or fundamental parameter methods are used to relate measured X-ray intensities to film thickness and composition. Regular calibration checks ensure accuracy and traceability.
Not publicly documented
The following facts about the CMI 950 XRF are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CMI 950 XRF are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the CMI 950 XRF are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CMI 950 XRF are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the CMI 950 XRF is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the CMI 950 XRF are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
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