Semitool
Storm 300 Wafer Cleaning
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Semitool Storm 300 is a wafer cleaning system used in semiconductor manufacturing. The system processes wafers with a diameter of twelve inches. The model was produced around the year 2010.[2]
How it works
General reference — not yet source-verifiedWafer cleaning systems operate by exposing wafers to chemical solutions that remove contaminants. The process generally involves a sequence of chemical steps, each targeting specific types of residues. Between chemical steps, wafers are rinsed with deionized water. The final step is drying, often accomplished by spin drying or using isopropyl alcohol vapor.
What do the numbers mean?
Wafer handling1
Configuration & options4
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Storm 300 Wafer Cleaning are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Storm 300 Wafer Cleaning are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Storm 300 Wafer Cleaning are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Storm 300 Wafer Cleaning are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Storm 300 Wafer Cleaning are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Storm 300 Wafer Cleaning is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]waferpedia.comwaferpedia.com
- [2]Equipment inventory listing
Last updated Sep 28, 2026.
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