SUSS MicroTec
GT200
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SUSS MicroTec GT200 is an eco-friendly manufacturing solution for wafer cleaning and stripping processes. The SUSS MicroTec GT200 combines photoresist removal, surface activation, and final cleaning in one configurable platform. The SUSS MicroTec GT200 supports up to 200 mm wafers.[1][2]
What it is
General reference — not yet source-verifiedThe GT200 is a wafer cleaning and stripping system for semiconductor manufacturing.
How it works
The GT200 combines TurbulenStrip and CrustBuster process technologies on one platform.[4][1][2]
The GT200 uses a hybrid cleaning approach that includes soak-bath stripping with green fluids, single-wafer handling, in-situ UV-based residue breakdown, megasonic DI-water rinse, and spin-rinse-dry functionality.[1][2]
Applications
The GT200 is intended for wafer cleaning and stripping operations in semiconductor fabrication.[1]
The GT200 supports up to 200 mm wafers and is specified for silicon, silicon carbide, and other supported wafer materials.[2]
- Wafer cleaning
What do the numbers mean?
Wafer handling4
Gas & chemistry2
Optics & imaging1
Dimensions & facilities1
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the SUSS MicroTec GT200?
The GT200 is a wafer cleaning system from SUSS MicroTec, belonging to the GreenTec Solutions line for eco-friendly wet processing.[3]
What cleaning approach does the GT200 use?
The GT200 achieves efficient wafer-level cleaning with stable processes, using significantly lower chemical consumption and no hazardous acids or organic solvents.[3]
Is the GT200 designed for environmental sustainability?
Yes, it is part of the GreenTec Solutions, which emphasizes lower chemical consumption and elimination of hazardous acids and organic solvents.[3]
Not publicly documented
The following facts about the GT200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the GT200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the GT200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the GT200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the GT200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the GT200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]suss.com — suss.comsuss.com
- [2]suss.com — suss.comsuss.com
- [3]suss.com — suss.comsuss.com
- [4]SUSS enters Wafer-Cleaning Market with launch of GreenTec Solutions Product Line and first GT200 System — prnewswire.comprnewswire.com
Last updated Oct 9, 2026.
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