Waferpedia

SUSS MicroTec

SB 6 GEN 2

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The SUSS MicroTec SB 6 GEN 2 is a substrate bonder. The SUSS MicroTec SB 6 GEN 2 accommodates standard size, semi spec wafers up to 150 mm in diameter. The SUSS MicroTec SB 6 GEN 2 supports multiple bonding processes.[1][2]

SB 6 GEN 2 — Inventory photo
Fig. 01SB 6 GEN 2Inventory photo[3]

Power

2000 V, 60 mA[1]

Vacuum

5 × 10-5 bar[1]

What it is

The SUSS MicroTec SB 6 GEN 2 is a wafer bonder for packaging and bonding work.[3][1]

The SB 6 GEN 2 is a substrate bonder that handles a range of substrate bonding processes.[1]

How it works

The SB 6 GEN 2 supports mechanical clamping of substrate stacks with a transport fixture before bonding.[1]

The SB 6 GEN 2 supports anodic bonding with a dedicated power supply.[1]

Where it fits in the process flow

The transport fixture can fit into the SUSS MA6 mask aligner, which allows pre-alignment before bonding.[1]

Applications

The SB 6 GEN 2 is used for MEMS and NEMS devices, 3D photonic devices, device packaging, and thin film material transfer.[1]

The SB 6 GEN 2 accommodates standard size, semi spec wafers up to 150 mm in diameter, as well as various shapes and types of materials.[1]

What do the numbers mean?

Power & electrical1

Power supply for anodic bonding
2000 V, 60 mA[1]
Accurate?

Vacuum & pumping1

Minimum chamber vacuum
5 × 10-5 bar[1]
Accurate?

Wafer handling3

Tool type
Substrate bonder[1]
Accurate?
Maximum wafer diameter
150 mm[1]
Accurate?
Substrate sizes
Pieces to 150 mm[1]
Accurate?

Configuration & options5

Maximum temperature
550 °C[1]
Accurate?
Maximum bonding force
20 kN[1]
Accurate?
Maximum thickness
9.99 mm[1]
Accurate?
Automation
Semi-automated[2]
Accurate?
Applications
MEMS, LED, packaging, 2.5D/3D integration[2]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Minimum chamber vacuum5 × 10-5 bar[1]
  • Power supply for anodic bonding2000 V, 60 mA[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What substrate size does the SB 6 GEN 2 support?

The SB 6 GEN 2 supports substrate pieces to 150 mm and accommodates a maximum wafer diameter of 150 mm.[1]

Does the SB 6 GEN 2 support anodic bonding?

The SB 6 GEN 2 includes a power supply for anodic bonding rated at 2000 V and 60 mA.[1]

Not publicly documented

The following facts about the SB 6 GEN 2 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SB 6 GEN 2 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the SB 6 GEN 2 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the SB 6 GEN 2 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the SB 6 GEN 2 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the SB 6 GEN 2 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]nist.gov — nist.govnist.gov
  2. [2]capneteq.com — capneteq.comcapneteq.com
  3. [3]Inventory photo
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Last updated Oct 4, 2026.

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