Tokyo Electron
Clean Track Lithius i+
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Tokyo Electron Clean Track Lithius i+ is a coater and developer system used in semiconductor manufacturing for photolithography processing.[2]
The Clean Track Lithius i+ is designed for the 193 nm immersion lithography process.[1][2]
How it works
General reference — not yet source-verifiedCoater and developer systems from the Tokyo Electron Clean Track family operate by spin-coating photoresist onto wafers, followed by soft-baking on hot plates to evaporate solvents and promote adhesion.
After wafer exposure in a lithography scanner, the system performs post-exposure bake and develops the latent image by applying developer solution, followed by rinsing and drying.
Where it fits in the process flow
General reference — not yet source-verifiedThe system receives wafers from prior process steps such as pre-cleaning or primer deposition and delivers developed wafers for subsequent pattern transfer steps like etching or ion implantation.
What do the numbers mean?
Gas & chemistry1
Configuration & options5
- 193nm Immersion[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Equipment typecoater/developer semiconductor manufacturing system[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the Clean Track Lithius i+?
The Clean Track Lithius i+ is a coater and developer semiconductor manufacturing system.[2]
Not publicly documented
The following facts about the Clean Track Lithius i+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Clean Track Lithius i+ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Clean Track Lithius i+ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Clean Track Lithius i+ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Clean Track Lithius i+ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Clean Track Lithius i+ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 9, 2026.
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