Tystar

Mini Tytan 4600

Thermal / Diffusion 50mm Tystar Mini Tytan 4600 family

Research Quality: 40% complete

The Tystar Mini-Tytan 4600 is a horizontal furnace system for diffusion, oxidation, and LPCVD applications. The Tystar Mini-Tytan 4600 processes wafers up to 150 mm (6 inches) in diameter. The Tystar Mini-Tytan 4600 can reach temperatures up to 850°C for silicon nitride and 650°C for other processes.^[1]

Mini Tytan 4600 — pnf.uchicago.edu — Fig. 01Mini Tytan 4600pnf.uchicago.edu^[1]

Wafer size

50mm

Vacuum

Four vacuum tubes in one furnace stack^[1]

Gas delivery

MFS-460^[1]

What is it?

The Tystar Mini-Tytan 4600 Furnace system consists of four vacuum tubes in one furnace stack, with two atmospheric pressure tubes and two low-pressure tubes. It is described as offering high process uniformity and supporting low-temperature oxide processes plus deposition of silicon nitride and polysilicon.

What can it run?

Process applications and technology nodes documented for this tool.

Diffusion
Oxidation
LPCVD
Suspended membrane fabrication
Silicon conductors
Silicon gate devices
MEMS
Inter level metal isolation
Optical waveguides
Dielectrics
LTO (Low Temperature Oxidation)
R & D

Why won't it start?

Documented failure modes, common issues, and field considerations.

LPCVD PROCESSING IS NOT CURRENTLY AVAILABLE.

What do the numbers mean?

Vacuum & pumping4

Furnace stack tubes: Four vacuum tubes in one furnace stack^[1]
Atmospheric pressure tubes: Two^[1]
Low-pressure tubes: Two^[1]
Number of Tubes: 4 (2 atmospheric, 2 low-pressure)^[1]

Wafer handling1

Wafer Size: up to 150 mm (6 inch)^[1]

Gas & chemistry1

Mass flow system: MFS-460^[1]

Configuration & options9

Maximum temperature for silicon nitride: Up to 850 °C^[1]
Maximum temperature for all others: Up to 650 °C^[1]
Maximum deposition thickness: 5 µm^[1]
Low temperature oxidation: For processes of < 450 °C^[1]
Data collection system: DCS-30^[1]
Maximum Temperature (Silicon Nitride): 850 °C^[1]
Maximum Temperature (Other Processes): 650 °C^[1]
Low Temperature Oxidation Temperature: < 450 °C^[1]
LPCVD Processing Status: Currently not available^[1]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Furnace stack tubesFour vacuum tubes in one furnace stack^[1]
Atmospheric pressure tubesTwo^[1]
Low-pressure tubesTwo^[1]
Mass flow systemMFS-460^[1]
Number of Tubes4 (2 atmospheric, 2 low-pressure)^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Mini Tytan 4600 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mini Tytan 4600 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mini Tytan 4600 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mini Tytan 4600 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Mini Tytan 4600 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Mini Tytan 4600 are on record.
Answerable by: an OEM parts catalog or a service engineer