YES
1224 P
Power
40 kHz[1]
Vacuum
Adixen Pascal 2021C2 vacuum pump (2)[2]
Performance
600 slides/hr for CVD[1]
Gas delivery
Software Specifications:[1]
Optics
0-999999[1]
What it is
The YES 1224 P is a manual-load vapor phase deposition system used to deposit thin films of organosilane materials onto substrates. The YES 1224 P was later renamed the YES-ÉcoCoat by the manufacturer. The YES 1224 P deposits films in a controlled sub-atmosphere process environment to achieve precise surface modification. The deposition chamber is constructed of 316L stainless steel. The YES 1224 P is rated for Class 10 cleanroom compatibility.[7][1]
How it works
The YES 1224 P delivers precursor chemicals by direct liquid metering for flash vaporization. The chemical delivery system operates without a carrier gas. The YES 1224 P uses VCR fittings on valves for reliable sealing and easier maintenance. The system heats substrates in a controlled sub-atmosphere process environment. The tool incorporates a plasma cleaning function that cleans the substrate prior to silane vapor deposition.[7]
The process chamber of the YES 1224 P measures 40.6 cm wide by 46 cm deep by 40.6 cm high. The chamber holds four removable internal stainless steel shelves, with up to sixteen available loading configurations. The YES 1224 P operates at temperatures from ambient to 205 °C, with a uniformity of ±5 °C during dwell after the stabilization period. The RF plasma operates at 40 kHz with power adjustable from 10 to 1000 watts. Plasma excitation is provided by an Advanced Energy PE-1000 AC plasma source.[1][2]
Applications
The YES 1224 P is used for precise surface modification across medical, MEMS, and semiconductor applications. In biotechnology, APTES and similar aminosilanes provide molecular-specific bonding sites for DNA and oligonucleotide adhesion on microarrays. Glass slide surfaces are modified with methoxysilanes and ethoxysilanes to provide functional groups that improve sample adhesion. For MEMS devices, a variety of organosilanes produce hydrophobic surfaces that reduce stiction. Antifouling coatings for medical devices modify surfaces to minimize protein buildup. Self-assembling monolayers of organosilanes provide thin diffusion barriers between copper and low-k dielectric in nanoscale devices.[7]
What do the numbers mean?
Power & electrical6
Vacuum & pumping3
Wafer handling1
Gas & chemistry7
Optics & imaging2
Performance2
Control & software3
- AMI 286 liquid level controller[2]
Configuration & options13
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Lam Research Concept One 200— Same function class: Deposition, nullCompare in depthsource[5]
- Applied Materials Centura 5200 Metal— Same function class: Deposition, nullCompare in depthsource[6]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Power Requirements208 VAC, 50/60 Hz, Single Phase, 25 FL Amps[1]
- Mass Flow ControlsSoftware Specifications:[1]
- RF Plasma Frequency40 kHz[1]
- RF Plasma Power10-1000 Watts[1]
- Chemical UsageTypical process 3-5 ml[1]
- Chemical Volume ControlControl down to 0.1 ml[1]
- Process Gas Inputs1[1]
- Plasma Gas Inputs3[1]
- Voltage208V, 50/60Hz[2]
- ConfigurationAdixen Pascal 2021C2 vacuum pump (2)[2]
- Power Requirements (first listing)208 VAC, 50/60 Hz, Single Phase, 25 FL Amps[1]
- Power Requirements (second listing)208 VAC, 30 A, 60 Hz, Single Phase, 4835 Watts[1]
- Chemical Usage (typical process)3-5 ml[1]
- Vent Gas Consumption10 SCF run average[1]
- Reactant Gas Consumption4.2 x 10-3 SCF (based on standard process: 170°C @ 1000 W w/20 SCFM pump)[1]
- Vacuum PumpAdixen Pascal 2021C2 vacuum pump (2)[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What are the chamber dimensions and material of the YES 1224 P?
The chamber is made of 316L stainless steel and measures 40.6 cm wide by 46 cm deep by 40.6 cm high.[1]
What temperature range does the YES 1224 P support?
The YES 1224 P operates from ambient temperature to 205 °C, with a uniformity of ±5 °C during dwell after the stabilization period.[1]
What are the RF plasma parameters of the YES 1224 P?
The RF plasma operates at 40 kHz with power adjustable from 10 to 1000 watts, supplied by an Advanced Energy PE-1000 AC plasma source.[1][2]
How many process recipes can the YES 1224 P store?
The YES 1224 P stores six CVD recipes and four plasma recipes, with exposure time programmable over a range of 0 to 999999 and a timer resolution of one second.[1]
What is the throughput of the YES 1224 P?
Wafer throughput is typically one to two loads per hour depending on the process, and slide throughput is 600 slides per hour for CVD.[1]
Does the YES 1224 P use a carrier gas for chemical delivery?
The YES 1224 P delivers chemicals by direct liquid metering for flash vaporization and does not require a carrier gas.[7]
Not publicly documented
The following facts about the 1224 P are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 1224 P are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 1224 P are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1224 P are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 1224 P are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 1224 P is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (8)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Equipment inventory listing
- [6]Equipment inventory listing
- [7]Vapor Phase Deposition Systems — yieldengineering.com (Dec 8, 2015)web.archive.org
- [8]pmd.mri.psu.edu — pmd.mri.psu.edupmd.mri.psu.edu
Last updated Sep 25, 2026.
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