Comparison ledger
Applied Materials 0010-13622 RF Match for, Perkin Elmer 6164, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | 6164Perkin Elmer |
|---|---|---|
| OEM | Applied Materials | Perkin Elmer |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Perkin Elmer 6164 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Metal deposition[2] |
| Model | 0010-13622[1] | 6164[2] |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Gases | — | nitrogen, CDA[2] |
| Nitrogen consumption | — | 30PSI[2] |
| Exhaust | — | for pumps only[2] |
| Voltage | — | 208V, 100A[2] |
| Make | — | Perkin Elmer[2] |
| Equipment type | — | Sputtering system[2] |
| Process | — | Metal deposition[2] |
| Wafer size | — | 6 inch[2] |
| Power | — | 208V, 100A[2] |
Plan your fab
Building a Deposition process? Get a complete equipment list.
Open the fab equipment planner →