Comparison ledger
EV Group 420 Mask, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 420 MaskEV Group | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | EV Group | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 420 Mask | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | Can only align wafers[1] | — |
| Wafer size | 6 inch[1] | — |
| Model designation | EV420[2] | — |
| Alignment capability | Can only align wafers; no exposure optics[1] | — |
| Serial number | AL4/2 011242007[2] | — |
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