EV Group
420 Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The EVG 420 Mask Aligner is a mask alignment tool manufactured by EV Group. The EVG 420 Mask Aligner can only align wafers and includes no exposure optics. The EVG 420 Mask Aligner handles wafers up to 6 inches in size.[1]
What it is
How it works
General reference — not yet source-verifiedMask aligners operate by bringing a photomask into proximity or contact with a wafer coated with photoresist. An alignment microscope and stage controls position the mask relative to the wafer. After alignment, ultraviolet light is projected through the mask to expose the photoresist.
What do the numbers mean?
Wafer handling3
- Can only align wafers[1]
Optics & imaging1
- No exposure optics[1]
Configuration & options2
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 420 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 420 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 420 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 420 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 420 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 420 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]auction.fabexchange.com — auction.fabexchange.comauction.fabexchange.com
Last updated Oct 5, 2026.
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