Comparison ledger
Hitachi HF3300, KLA .496 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | HF3300Hitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi HF3300 | KLA .496 PSL Wafer |
| Specifications | ||
| Instrument Type | Transmission electron microscope (TEM)[1] | — |
| Instrument Code | TEM-14[1] | — |
| Facility Section | Charge Beam Imaging[1] | — |
| Tool designation | Hitachi HF3300(S) Megascope[1] | — |
| Model | HF3300(S)[2] | — |
| Manufacturer | Hitachi[2] | — |
| Instrument type | Transmission electron microscope[3] | — |
| Mode capability | Scanning transmission electron microscopy (STEM)[2] | — |
| Accelerating voltage | 300 kV[2] | — |
| TEM resolution | 0.13 nm[2] | — |
| STEM resolution | 0.1 nm[2] | — |
| Detectors | Annular dark field (ADF) detector and bright field (BF) detector[2] | — |
| EDS | Dual Oxford energy dispersive X-ray spectroscopy detectors[2] | — |
| EELS | Electron energy loss spectroscopy detector[2] | — |
| Microscopy capabilities | High resolution Lorentz microscopy and electron holography[2] | — |
| In-situ heating | Possible with a Norcada heating holder with biasing contacts[2] | — |
| Gas flow injection | Air, O2, H2O vapor, CO2, and H2[2] | — |
| Configuration | — | NIST Traceable[4] |
| Wafer size | — | 8 inch[4] |
| Traceability | — | NIST Traceable[4] |
| Compatible systems | — | Capable on Surfscan 6xy0 and SP1[4] |
| Category | — | Metrology & Inspection[5] |
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