Lam Research
SEZ SP 223 Spin Processing alternatives
Comparable Resist Processing equipment documented in the Waferpedia catalog.
6 comparable tools
Headway
1 EC 101 R 485 Photoresist Spinner
Resist Processing
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
CEE
100 Spin
Resist Processing
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
EV Group
120 Automated Coater Processing
Resist Processing
The EV Group 120 Automated Coater Processing System is an automated coater for 6-inch and 8-inch wafers, built in 2015 and requiring 50/60 Hz, 3-phase, 4-wire plus ground power.
Axcelis
200 PCU Photoresist Stabilizer
Resist Processing
TEGAL
211
Resist Processing
The TEGAL 211 is a table top plasma etcher/asher for up to 3-inch wafers with an aluminum chamber.
PVA TePla
300
75 mm to 100 mm
Resist Processing
The PVA TePla 300 is a high-frequency plasma etch tool used for photoresist stripping, wafer surface cleaning, and hydrophilic surface enhancement.
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare SEZ SP 223 Spin Processing with another model →