Laurell
WS-650-15 B alternatives
Comparable Resist Processing equipment documented in the Waferpedia catalog.
6 comparable tools
Laurell
EDC-650-15B
300mm
Resist Processing
The Laurell EDC-650-15B is an EDC System spin coater. The Laurell EDC-650-15B supports a maximum substrate size of 300 mm (9" x 9").
Laurell
EDC-HL-15 B
300mm
Resist Processing
The Laurell EDC-HL-15 B is an EDC™ System spin coater in the 650-series. The Laurell EDC-HL-15 B accepts a maximum substrate size of 300mm (9" x 9") and reaches 12000 rpm.
Laurell
H6-15 B
300mm
Resist Processing
The Laurell H6-15 B is a spin coater in the 650-series. The Laurell H6-15 B supports a maximum substrate size of 300mm (9" x 9") and a maximum speed of 12000 rpm.
Laurell
WS-650-15B
300mm
Resist Processing
The Laurell WS-650-15B is a spin coater in the 650 Series.
Headway
1 EC 101 R 485 Photoresist Spinner
Resist Processing
Headway 1 EC 101 R 485 is a photoresist spinner with stated vacuum and electrical requirements.
CEE
100 Spin
Resist Processing
The CEE 100 is a spin coater with a listed power specification of 115 volts and 800 watts.
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