Comparison ledger
Oxford Instruments 100 ICP Fluorine, SCREEN SU 2000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | SU 2000SCREEN |
|---|---|---|
| OEM | Oxford Instruments | SCREEN |
| Category | Etch | Etch |
| Wafer size | — | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | SCREEN SU 2000 |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[1] | — |
| Cryo DRIE etch rate | up to 5 µm/min[1] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[1] | Wafer currently configured for 6"[2] |
| Configuration | — | Under OEM Maintenance[2] |
| Station List | — | Lp, MPC1, MPC2, MPC3, MPC4, Reverser Unit, CR, PF, I/F (N2/air)[2] |
| Chemicals Used | — | Stripper, Qz, ST (also used for NMP in place of one)[2] |
| Application | — | Single wafer spray solvent tool[2] |
| Sation List | — | Lp, MPC1, MPC2, MPC3, MPC4, Reverser Unit, CR, PF, I/F (N2/air)[3] |
| Wafer Size | — | 6 inch, 8 inch[2] |
| Chemicals | — | Stripper, Qz, ST, NMP[2] |
| Vintage | — | 2017[2] |
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