Comparison ledger
Plasma-Therm Versaline VLN ICP, Tegal 1511e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Versaline VLN ICPPlasma-Therm | 1511eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | Brooks TM (Transfer Module) with four Wafer Manual Load Lock | three- to six-inch wafers |
| Process node | — | — |
| Introduced | — | 1984 |
| Production run | — | 1984– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm Versaline | Tegal 1511e |
| Specifications | ||
| Configuration | Manual Load Lock for Single or Multiple Wafers[1] | — |
| Voltage | 208V, 60 Hz, 3 phase[1] | — |
| Wafer size | Brooks TM (Transfer Module) with four Wafer Manual Load Lock[2] | — |
| Manufacturer | Plasma-Therm[1] | — |
| Model | Versaline VLN ICP[1] | — |
| Category | Etch[3] | — |
| Process type | Inductively coupled plasma[1] | — |
| Wafer handling | Manual load lock for single or multiple wafers[1] | — |
| Chamber | Single ICP chamber[2] | — |
| RF power supply 1 | ENI ACG-6B RF Power Supply – 600W @ 13.56MHz with Seren AT6NVL Matchwork & MC2 Tunner[1] | — |
| RF power supply 2 | ENI GMW-25A RF Power Supply – 2500W @2.0MHz with Seren AT25NVL Matchwork & MC2 Tunner[1] | — |
| Pressure controller | VAT PM5 Pressure Controller with Leybold Turbo pump[2] | — |
| Turbo pump | Seiko Seiki 1303CV Turbo Pump with Seiko Seiki SCU 750 controller[2] | — |
| Gas handling | (5) MFCs-gas with Isolation, Process and By-pass valves[1] | — |
| Backside cooling | He Backside Cooling[1] | — |
| Chamber heater | Watlow chamber heater and controller[1] | — |
| Control software | Windows Based OS[1] | — |
| Electrical | 208V, 60 Hz, 3 phase[1] | — |
| tool type | — | tri-electrode dual-frequency plasma etch system[4] |
| wafer size | — | three- to six-inch wafers[4] |
| first sold | — | 1984[4] |
| system characteristic | — | first vacuum-loadlocked dual-frequency tri-electrode etch system[4] |
| First vacuum-loadlocked dual-frequency tri-electrode etch system | — | Yes[4] |
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