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Comparison ledger

421 Scepter Spray Solventversus421 Spray Solvent

Semitool 421 Scepter Spray Solvent, Semitool 421 Spray Solvent, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSemitoolSemitool
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizeBatch Solvent Processor for Wafer CleaningBatch Solvent Processor for Wafer Cleaning
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 421Semitool 421
Cited variants
Specifications
Wafer sizeBatch Solvent Processor for Wafer Cleaning[2]Batch Solvent Processor for Wafer Cleaning[5]
ConfigurationMax Substrate Size of 8”/200mm[2]Single Chamber[5]
Maximum substrate size200 mm (8 inch)[2]—
Batch capacityUp to 50 wafers[3]—
Chamber typeSingle chamber[3]—
Automation levelSemi-automated[3]—
Number of tanks4 stainless steel (2 heated, 2 ambient)[4]—
Process applicationsPolymer removal, resist stripping, wafer cleaning, metal lift-off[4]—
OEM model numberSST-421[4]—
Also known asScepter Spray Solvent Tool (SST)[2]—
Maximum wafer count per batch50 wafers[2]—
Number of heated tanks2[4]—
Rotor included1 rotor (select size at time of order)[4]—
Touch screenClass 1 Touch Screen Monitor[1]—
PumpsPneumatic pumps, Trebor 610 back[1]—
Process Applications—Polymer Removal, Resist Stripping, Wafer Cleaning, Metal Lift-Off[5]
Max Wafer Size—8"/200mm Wafers[5]
Chamber Type—Single Chamber[5]
Number of Tanks—4[5]
Heated Tanks—2[5]
Ambient Tanks—2[5]
Rotor Included—1[5]
Max Wafers per Batch—50 wafers[3]
Vintage—2004[5]
Wafer Size—200 mm[1]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]hfsemi.comhfsemi.com
  2. [2]inventory listing
  3. [3]classoneequipment.comclassoneequipment.com
  4. [4]classoneequipment.comclassoneequipment.com
  5. [5]inventory listing