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Comparison ledger

LabSpin6 / 8versusScientific FEI NanoLab 1200 AT FIB

SUSS MicroTec LabSpin6 / 8, Thermo Fisher Scientific FEI NanoLab 1200 AT FIB, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
LabSpin6 / 8SUSS MicroTec
OEMSUSS MicroTecThermo Fisher
Category——
Wafer size200mm200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec LabSpin6 / 8Thermo Fisher Scientific FEI NanoLab 1200 AT FIB
Specifications
Substrate Sizeup to 200 mm[1]—
Process CapabilitySpin coating, Puddle developing[1]—
Operation TypeManual[1]—
Configuration—IXL120 Pump[2]
Modes—SE, BSE[2]
Wafer size—High-throughput wafer carrier Kit, (200 mm - 300 mm)[2]
Vacuum—IXL120 Pump[3]
Power—S2 Compliant, 60 Hz[3]
Gas delivery—Carbon deposition precursor[3]
Optics—(2) X-Max Detectors, 80 mm HASKRIS Chiller[3]
Wafer handling—High-throughput wafer carrier Kit, (200 mm - 300 mm)[2]
(2) 16—10 LCD Monitors, 24"[2]
Operating system—Windows XP Manuals[2]
Sources (3)Every fact above is drawn from these public sources
  1. [1]hilpert.chhilpert.ch
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com