Waferpedia

Comparison ledger

1512eversusNE 950 ICP-RIE

Tegal 1512e, Ulvac NE 950 ICP-RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1512eTegal
OEMTegalUlvac
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTegal 1512eUlvac NE 950
Specifications
Tool typeIndustrial RIE plasma etcher system[1]—
Stated configurationWith modules assembly for CI-4222[1]—
Configuration—Gas Box:[2]
Gas 1 Horiba STEC SEC-E40 Ar—100SCCM[2]
Gas 2 Horiba STEC SEC-E40 O2—100SCCM[2]
Gas 3 Horiba STEC SEC-E40 CHF3—100SCCM[2]
Cooling Gas—MKS 649A 50SCCM[2]
Match Box 1—AMV-1000-12.5M-CT[2]
Match Box 2—AMV-1000-AV3[2]
Valve—MKS T3PIA 26696[2]
Gauge—MKS E28D[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com
  2. [2]inventory listing