Comparison ledger
Accretech , Tokyo Semitsu Kogaku (TSK) UF3000, GCA 3696, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | , Tokyo Semitsu Kogaku (TSK) UF3000Accretech | 3696GCA |
|---|---|---|
| OEM | Accretech | GCA |
| Category | — | — |
| Wafer size | Wafer Equipment | 150mm |
| Process node | — | legacy semiconductor lithography equipment |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | g-line |
| Family | Accretech , Tokyo Semitsu Kogaku (TSK) UF3000 | GCA 3696 |
| Cited variants | — |
|
| Specifications | ||
| Wafer size | Wafer Equipment[2] | 3" up to 150mm; smaller pieces[1] |
| Currently Configured for | 300mm[2] | — |
| With Chiller | SCU-600B[2] | — |
| Section 1 | Tool General Information[2] | — |
| Section 2 | Tool Specific Information[2] | — |
| Manufacturer | Accretech, Tokyo Semitsu Kogaku (TSK)[2] | — |
| Model | UF3000[2] | — |
| Category | Wafer Equipment[2] | — |
| Equipment type | Wafer Prober[2] | — |
| Tool status | In production[2] | — |
| Tool location | Cleanroom[2] | — |
| Chiller | SCU-600B[2] | — |
| Vendor tool serial number | F24006MZ[2] | — |
| Micron MISTI/LID number | FE3SKAA300(TMM)[2] | — |
| Year | 2004[3] | — |
| Quantity | 9[4] | — |
| Short description | Fully Automated Prober[4] | — |
| Version | 300 mm[4] | — |
| Nickel chuck | 12 inch[4] | — |
| Front loading | 300 mm single FOUP loading[4] | — |
| Robot blade | Dual ceramic robot blade[4] | — |
| Software version | S5.0FC4[4] | — |
| Loader type | TSK[4] | — |
| Chuck temperature range | 30~150℃[4] | — |
| OCR camera type | Type6[4] | — |
| Auto card change | Yes[4] | — |
| Needle cleaning unit | 150 mm x 150 mm ceramics pad[4] | — |
| Manipulator | Hinge, MHF4000[4] | — |
| Test system interface | AL6050 & Focus3000[4] | — |
| Includes | Printer[4] | — |
| Instrument type | — | Photorepeater system[1] |
| Conversion note | — | Can be easily converted to function as a GCA 3696 Photorepeater system[1] |
| Exposure target | — | Photoresist-coated glass plates[1] |
| Maximum plate size | — | Up to 7"[1] |
| Exposure wavelength | — | g-line (436nm)[1] |
| Numerical aperture | — | 0.30 N.A.[1] |
| Reduction | — | 5:1 reduction[1] |
| Field size | — | Variable field size up to 15mm square[1] |
| Minimum feature size | — | <0.9µm[1] |
| Registered alignment | — | Typically <0.25µm[1] |
| Mask size | — | 5" x 0.090"-thick masks[1] |
| Stage motion | — | Laser-controlled stage motion[1] |
| Type | — | Step-and-repeat camera (stepper)[5] |
| Lens | — | Zeiss lens with 0.30 numerical aperture[1] |
| Resolution | — | 0.9 µm[1] |
| Reduction ratio | — | 5:1[1] |
| Control computer | — | DEC PDP-11/04[5] |
| Interface chassis | — | 9280 Interface Chassis[5] |