Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusIGX 600 M

Applied Materials 0010-03485 Magnet Assy, Edwards IGX 600 M, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
IGX 600 MEdwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards IGX 600 M
Cited variants—
  • iGX600M 200 V-230 V 50/60 Hz[1]
  • iGX600M 380 V-460 V 50/60 Hz[1]
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]IGX 600 M[7]
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]Edwards[7]
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Inlet—ISO100[6]
Exhaust—KF25[6]
Pumping speed—365 CFM[6]
Ultimate pressure—5.25 x 10-4 Torr[6]
Weight—485 lbs[6]
Type of product—dry pump[6]
Sources (7)Every fact above is drawn from these public sources
  1. [1]manualslib.commanualslib.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]provac.comprovac.com
  7. [7]Equipment inventory listing