Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Nikon NSR SF 200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | NSR SF 200Nikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Nikon NSR |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | HDD not included[3] |
| Chamber Type | — | Asahi[3] |
| Reticle Size | — | 6"[3] |
| Field Size | — | 26[3] |
| RL Linrary | — | L10+10[3] |
| Reticle PD/PPD | — | YEs[3] |
| Reticle SMIF | — | No[3] |
| Wafer Chuck Type | — | Pin[3] |
| Wafer Loader Type | — | Type 3[3] |
| Pre Alignment 2 | — | OF[3] |
| In-Line | — | Right[3] |
| Wafer Carrier Table | — | Right[3] |
| Alignment Sensor | — | LSA/FIA/LIA[3] |
| Mini Computer | — | Alpha[3] |
| Software Version | — | MCSV: Ver E5.21F Tool[3] |
| Laser | — | Gigaphoton G21K2[3] |
| Laser Total Shot | — | 19420.349 Mpls[3] |
| Wavelength | — | 248 nm[4] |
| Lens NA | — | 0.63[4] |
| Exposure Area | — | 26 mm x 33 mm[4] |
| Reduction Ratio | — | 1/4[4] |
| Resolution | — | < 150 nm[4] |
| Throughput (300 mm) | — | > 110 wafers/hour[4] |
| Throughput (200 mm) | — | > 120 wafers/hour[4] |
| Wafer Size (stated by source) | — | 200/300 mm[4] |
| Wafer Size (other source) | — | 6 inch[3] |