Comparison ledger
EV Group 101, Ultratech Titan 4700, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | Titan 4700Ultratech |
|---|---|---|
| OEM | EV Group | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Ultratech Titan 4700 |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | — |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Optics | — | G and H line[4] |
| Lamp Power | — | 1000 W[4] |
| Extended Focus Option | — | Yes (for thick resist exposure)[4] |
| Wafer Sizes Supported | — | 4 inch, 5 inch, 6 inch, 8 inch[4] |
| Reticle Size | — | 5 inch (upgradable to 6 inch)[4] |
| Maximum Field of View | — | 44 mm x 26.7 mm[4] |
| Numerical Aperture | — | 0.32[4] |
| Robot | — | Genmark[4] |
| Machine Vision System | — | Cognex[4] |
| Reticle Bar Code Reader | — | Yes[4] |
| Auto Aperture | — | For 2 or 3 field reticles[5] |
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