Comparison ledger
Lam Research 9600 TCP Metal, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 9600 TCP MetalLam Research | 1512eTegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research TCP 9600 | Tegal 1512e |
| Specifications | ||
| Configuration | with 3 HALO generators[1] | — |
| Plasma source | Transformer Coupled Plasma (TCP)[2] | — |
| Wafer size compatibility | 6-inch (150mm) and 8-inch (200mm)[2] | — |
| Chuck type | Ceramic ESC with helium backside cooling[2] | — |
| Endpoint control | Optical Emission Spectroscopy (OES)[2] | — |
| Automation interface | SECS/GEM Protocol[2] | — |
| Process chamber | Anodized aluminum, quartz-lined[2] | — |
| Typical etch targets | Al, TiN, Cu, W, Oxide, Nitride, Poly[2] | — |
| Tool type | — | Industrial RIE plasma etcher system[3] |
| Stated configuration | — | With modules assembly for CI-4222[3] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →