Aixtron
2600 G 3 IC R MOCVD Reactor
The Aixtron 2600 G 3 IC R MOCVD Reactor is a metal organic chemical vapor deposition reactor. The Aixtron 2600 G 3 IC R MOCVD Reactor is configured for AlInGaP MOCVD epitaxy. The Aixtron 2600 G 3 IC R MOCVD Reactor uses 7 x 6-inch wafers.[1][2]
What it is
How it works
The Aixtron 2600 G 3 IC R uses an RF coil heating system with a Trumpf Huttinger RF generator, gas foil rotation, and in-situ pyrometry.[1][2]
The Aixtron 2600 G 3 IC R includes a quartz ceiling with temperature control, a custom built exhaust system, a process pump, glove box pumping, and an abatement subsystem.[1][2]
Applications
The Aixtron 2600 G 3 IC R is used for AlInGaP MOCVD epitaxy.[1][2]
The Aixtron 2600 G 3 IC R uses metal organic sources including TMIn, TMGa, TMAl, Cp2Mg, and DIPTe, and hydride sources including PH3, AsH3, and 100 ppm SiH4 in Ar.[1][2]
The Aixtron 2600 G 3 IC R includes concentration monitors for TMIn and an Entegris getter for hydrogen.[1][2]
What do the numbers mean?
Power & electrical1
Vacuum & pumping3
- Custom built Exhaust System[1]
Wafer handling1
Gas & chemistry1
Control & software5
- Quartz Ceiling with Temperature Control[1]
Configuration & options17
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Not publicly documented
The following facts about the 2600 G 3 IC R MOCVD Reactor are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2600 G 3 IC R MOCVD Reactor are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 2600 G 3 IC R MOCVD Reactor are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 2600 G 3 IC R MOCVD Reactor are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 2600 G 3 IC R MOCVD Reactor are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 2600 G 3 IC R MOCVD Reactor is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]2600 G 3 IC R MOCVD Reactor — Aixtron | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 11, 2026.
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