Waferpedia

AJA

ATC Orion

Deposition6 inAJA ATC Orion family
Research Quality: 90% complete

The AJA ATC Orion 8 UHV Sputtering System is a PVD tool that deposits films on a substrate using magnetron sputtering. The AJA ATC Orion 8 uses accelerated, positively charged ions from a plasma source to achieve an increased deposition rate and more controlled electron bombardment compared to other sputtering systems.[1]

ATC Orion — pnf.uchicago.edu
Fig. 01ATC Orionpnf.uchicago.edu[1]
  • Plate 01Magnetron Sputtering Demonstration with ATC Orion 5 UHV

    UW Clean Energy InstituteWatch on YouTube

Wafer size

6 in

Power

DC and RF generators[1]

Vacuum

< 3x10^-7 Torr[2]

Gas delivery

Oxygen and nitrogen[1]

What it is

The AJA ATC Orion is a physical vapor deposition tool for sputter deposition of thin films on substrates.[1][2]

The AJA ATC Orion 8 at Pritzker Nanofab is an UHV sputtering system with a turbo-pumped vacuum load lock and a Phase II-J computer control system.[1]

How it works

The AJA ATC Orion 8 uses magnetron sputtering sources and supports DC and RF generators for deposition control.[1]

The AJA ATC Orion 8 supports reactive sputtering with oxygen and nitrogen, substrate biasing, and multiple sputter sources for multi-material deposition.[1][2]

Where it fits in the process flow

The AJA ATC Orion 8 at Pritzker Nanofab accommodates substrates to 6 inches and supports up to 5 3-inch sputter sources, while the UMD FabLab unit is used primarily for multiple-layer depositions with and without 3-inch masks.[1][4]

Applications

The AJA ATC Orion 8 is used for corrosion-resistant coatings, low-friction coatings, hard wear-resistant coatings, and coatings with specific electrical and optical properties.[1]

The UMD FabLab uses the AJA ATC Orion 8 for multilayer depositions and lists installed targets including V2O5, FeF3, Cr, Ti, ZnO, Li3PO4, and Au.[4]

  • Corrosion resistant coatings
  • Low friction coatings
  • Hard, wear resistant coatings
  • Coatings with specific electrical and optical properties

What do the numbers mean?

Power & electrical5

Power sources
DC and RF generators[1]
Accurate?
Options
RF bias option[1]
Accurate?
Generators
DC and RF generators[1]
Accurate?
RF bias option
Available[1]
Accurate?
Deposition technique
Magnetron sputtering (DC and RF)[1]
Accurate?

Vacuum & pumping4

Vacuum load lock
Turbo-pumped vacuum load lock with 6-position cassette[1]
Accurate?
Load lock
Turbo-pumped vacuum load lock with 6 position cassette[1]
Accurate?
Base pressure (twin chamber)
< 3x10^-7 Torr[2]
Accurate?
Pumping (twin chamber)
800 L/s turbomolecular pump on each chamber[2]
Accurate?

Wafer handling5

Substrate size
Up to 6 in[1]
Accurate?
Substrate size
6 inches[1]
Accurate?
Substrate size
Up to 6 inches (150 mm)[1]
Accurate?
Substrate heating (twin chamber)
Quartz lamp up to 800°C[2]
Accurate?
Substrate heating (single chamber)
Quartz halogen lamp, RT – 850°C[3]
Accurate?

Gas & chemistry2

Reactive sputtering gases
Oxygen and nitrogen[1]
Accurate?
Reactive gases
Oxygen and nitrogen (also argon)[1]
Accurate?

Control & software2

Control system
Phase II-J Computer Control System[1]
Accurate?
Computer control system
Phase II-J Computer Control System[1]
Accurate?

Configuration & options9

Tool type
Physical vapor deposition (PVD) tool[1]
Accurate?
Deposition method
Magnetron sputtering[1]
Accurate?
Magnetron sputtering sources
Stiletto (HV) magnetron sputtering source; A330-XP-O (UHV) magnetron sputtering source[1]
Accurate?
Sputter source capacity
Up to 5 3 in sputter sources[1]
Accurate?
Number of sputter sources
Up to 5 x 3 inch[1]
Accurate?
Sputter source types
Stiletto (HV) magnetron sputtering source; A330-XP-O (UHV) magnetron sputtering source[1]
Accurate?
Reactive sputtering
Capable of reactive sputtering with oxygen and nitrogen[1]
Accurate?
Magnetron sources
Stiletto (HV) and A330-XP-O (UHV)[1]
Accurate?
Number of magnetron cathodes (twin chamber)
Four per deposition chamber[2]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Vacuum load lockTurbo-pumped vacuum load lock with 6-position cassette[1]
  • Reactive sputtering gasesOxygen and nitrogen[1]
  • Power sourcesDC and RF generators[1]
  • OptionsRF bias option[1]
  • Load lockTurbo-pumped vacuum load lock with 6 position cassette[1]
  • GeneratorsDC and RF generators[1]
  • RF bias optionAvailable[1]
  • Deposition techniqueMagnetron sputtering (DC and RF)[1]
  • Reactive gasesOxygen and nitrogen (also argon)[1]
  • Base pressure (twin chamber)< 3x10^-7 Torr[2]
  • Pumping (twin chamber)800 L/s turbomolecular pump on each chamber[2]

Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

Can the AJA ATC Orion 8 perform reactive sputtering?

Yes, the system is capable of reactive sputtering with oxygen and nitrogen.[1]

Does the AJA ATC Orion 8 support both DC and RF power?

Yes, the system is equipped with both DC and RF generators.[1]

What type of load lock does the AJA ATC Orion 8 use?

The system uses a turbo-pumped vacuum load lock with a 6-position cassette.[1]

Not publicly documented

The following facts about the ATC Orion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ATC Orion are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the ATC Orion are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the ATC Orion are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the ATC Orion are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the ATC Orion is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (6)Every fact above is drawn from these public sources
  1. [1]pnf.uchicago.edu — pnf.uchicago.edupnf.uchicago.edu
  2. [2]uwaterloo.ca — uwaterloo.cauwaterloo.ca
  3. [3]ece.utoronto.ca — ece.utoronto.caece.utoronto.ca
  4. [4]DEP-09: AJA ATC Orion 8 Sputtering system | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
  5. [5]Cleanroom Facilities | Shared Equipment Authority (SEA) | Office of Research | Rice University — research.rice.eduresearch.rice.edu
  6. [6]HV & UHV Sputter Sources for R&D Sputtering Systems — m.ajaint.com (Jul 14, 2020)web.archive.org
Was this page accurate?

Last updated Sep 22, 2026.

Compare with similar tools

View all →