Applied Materials
Centura Super E
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedAn etch system removes selected material from a wafer by directing a controlled plasma or reactive process at patterned surfaces.
A chambered etch platform supports repeated processing in a controlled vacuum environment, with loadlocks used to move wafers into and out of the process region while limiting exposure to ambient air.
Where it fits in the process flow
General reference — not yet source-verifiedAn etch tool sits in the pattern-transfer portion of the fab flow after lithography has defined the mask pattern on the wafer.
The etch step transfers the pattern into underlying films or substrate layers before subsequent clean, deposition, or inspection steps.
Applications
What do the numbers mean?
Wafer handling3
- Wide Body Loadlocks[1]
Configuration & options3
- 3 Chamber Super E Positions a,b, and C[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Centura Super E are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura Super E are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura Super E are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura Super E are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura Super E are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura Super E is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Centura Super E — Applied Materials | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 10, 2026.
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