Waferpedia

KLA

FT 750

LithographyKLA FT 750 family
Research Quality: 20% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

KLAFT 750
No photo available yet

What is it?

The KLA FT-750 is a visible light spectrophotometer-based thin film measurement system for semiconductor process control.

What do the numbers mean?

Gas & chemistry2

Gas
no chemicals[1]
Accurate?
Gas chemistry
None (no chemicals)[1]
Accurate?

Control & software1

Operating system
DOS[1]
Accurate?

Configuration & options5

OS
DOS[1]
Accurate?
Measurement technology
Visible light spectrophotometer[2]
Accurate?
Reflectivity mapping
Yes[2]
Accurate?
Optional gamma curve plotting
Yes[2]
Accurate?
Applications
CVD, etch, lithography, diffusion[2]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Gasno chemicals[1]
  • Gas chemistryNone (no chemicals)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

What measurement technology does the FT 750 use?

The FT 750 uses visible-light spectrophotometer technology.[2]

Which processes does the FT 750 support?

The FT 750 is used for CVD, etch, lithography, diffusion, and other processes.[2]

What film-related effects do the FT 750 algorithms account for?

The FT 750 algorithms account for film dispersion, underlying film thickness, and differing numerical apertures.[2]

What does the FT 750 help determine for photoresist?

The FT 750 automatically determines the contrast and sensitivity of virtually any photoresist.[2]

Not publicly documented

The following facts about the FT 750 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FT 750 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the FT 750 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the FT 750 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the FT 750 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the FT 750 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.org — tencor.com (Apr 22, 1999)web.archive.org
Was this page accurate?

Last updated Oct 11, 2026.

Compare with similar tools

View all →